Layers
of single crystal germanium have been prepared by pyrolytic
decomposition of GeI2 at about 350°C upon single crystal seeds
of germanium by J. C. Marinace. The substrate germanium could
be removed and the resultant thin layers (∼5×10-3 cm) studied. The Hall coefficient and
resistivity measured on these layers by Dunlap et al. showed that the layers as
grown were usually n type and contained about 1016 donors/cm3.
These donors are situated at 0.22±0.04 ev below the conduction band. In the
work reported here, the photoresponse of such layers at 77°K was found to
extend to about 6 μ in substantial agreement with this thermal activation
energy. The 0.2‐ev donors apparently can be annealed out by prolonged
heating at 550°C. The layers could also be intentionally doped with standard
acceptors such as Al during formation. It was hoped that it would be possible
to obtain the incorporation of Au into the layers. For this purpose, layers for
which Au doping was attempted were annealed to remove the 0.2‐ev
donors. Although some of the layers became p type, a comparison of the
photoresponse at 77°K with the photoresponse obtained for a 5×10-3 cm
thick p‐type plate of regularly Au‐doped germanium showed
no evidence for the 0.15 ev Au level. Likewise, annealed layers for which Ag
doping was attempted were examined but yielded no positive identification of
the 0.14‐ev level of Ag.
Source:IEEE
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